Thin-film fine lines and traces are produced by sputtering metal on ceramic substrates and then using photolithography to etch back fine lines and spacings. Line trace widths of .0005 inches are possible using this technology. Oasis produces these substrates in its Nevada facility and is one of the last remaining independent job shops employing this technology in the United States.
Due to its ability to sputter fine line traces of gold on ceramic substrates this type of circuit is ideal for the challenges of RF circuits.
Fine Line Metalized Circuits
In addition to RF circuits, Thin film substrates are ideal for high-density surface interconnects. The ability to put dense circuits with the high reliability of ceramic is ideal for the complex designs needed for military applications.